UV Objectives

● Air Spaced Doublet or Triplet design for maximum UV transmission
● Infinite conjugate ratio design
● Perfect for micromachining, laser scribing, and microlithography
  • 型號
  • 產品概述
  • 庫存
  • 詢價數量
  • 詢價車
28-21-50-000

50X LWD Objective, 0.55 NA, 13mm WD

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28-21-02-000

2X LWD Objective, 0.055 NA, 34mm WD

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28-21-05-000

5X LWD Objective, 0.14 NA, 34mm WD

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28-21-10-000

10X LWD Objective, 0.30 NA, 34mm WD

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28-21-11-000

20X LWD Objective, 0.42 NA, 20mm WD

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28-20-44-000

5X LWD High-Resolution, 0.225 NA, 34mm WD, -0.6mm Back Focal Distance

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28-20-45-000

10X LWD High-Resolution, 0.45 NA, 19mm WD, -31.0mm Back Focal Distance

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28-20-46-000

20X LWD High-Resolution, 0.60 NA, 13mm WD, -14.7mm Back Focal Distance

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 Substrate Material  UV grade fused silica
 Wavefront Distortion  λ/4 at 633nm typical
 Antireflection Coating  User specified, Ravg 0.5%
 Damage Threshold  1 J/cm2, 8 nsec pulse at 248nm typical
 Housing  Black anodized barrel or mounted into a microscope objective style
 stainless steel housing

 

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