[產品資訊] XUV Dichroic Mirrors

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♦ Advantages

• Higher damage threshold than beam separator (Brewster angle type) and thin film XUV filer for HHG.
• Broad bandwidth coverage.
• Able to efficiently separate and combine  XUV and NIR.
• Standard and customized specifications are available to fulfill customer’s requests.

♦ Product descriptions

Standard model	DM-20/800-2002	DM-30/800-2002
AOI	78 degrees78 degrees
Polarization	p
NIR reflectivity	～2% @ 800 nm +/- 50 nm
XUV reflectivity	～ 60% @ 20nm	～ 60% @ 30nm
Ccoating	Dielectric AR
Substrate material	Fused silica
Size	2” dia., 10 mm thick

Parameters for custom specifications.
AOI	75 deg ～ 87 deg
Polarization	s, p
AR wavelength	400 nm, 800 nm, 1000 nm, etc.
HR wavelength	3-5 nm, 13 nm, 30 nm, 60 nm, etc.
Substrate material	Fused silica
Substrate size	1″ dia. – 4″ dia.

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